Browse Standards
3488+ standards in database
3488 result(s) found
硝基苯胺类
Nitroanilines
工业用碳酸二甲酯
Dimethyl carbonate for industrial use
工业用磷酸三乙酯
Triethyl phosphate for industrial use
工业用甲酸甲酯
Methyl formate for industrial use
纯甲烷和高纯甲烷
Pure methane and high pure methane
化学试剂 N-(1-萘基)乙二胺盐酸盐
Chemical reagent—N-(1-naphthyl)ethylenediamine dihydrochloride
化学试剂 N,N-二甲基对苯二胺盐酸盐
Chemical reagent—N,N-dimethyl-p-phenylenediamine dihydrochloride
化学试剂 盐酸副玫瑰苯胺溶液
Chemical reagent—Pararosaniline hydrochloride solution
水处理剂 聚二甲基二烯丙基氯化铵
Water treatment chemicals—Poly(diallyldimethylammonium chloride)
工业用甲基三丁酮肟基硅烷
Methyltris(methylethylketoxime)silane for industrial use
工业用聚N-乙烯基吡咯烷酮
1-Vinyl-2-pyrrolidinone homopolymer for industrial use
2-氨基-4-甲基-5-氯苯磺酸（CLT酸）
2-Amino-5-chloro-4-methybenzenesulfonic acid(CLT acid)
工业用1,1,1,2-四氟乙烷（HFC-134a）
1,1,1,2-Tetrafluoroethane(HFC-134a) for industrial use
工业氯磺酸
Chlorsulphonic acid for industrial use
分散深蓝S-3BG 200%（C.I.分散蓝79）
Disperse dark blue S-3BG 200%（C.I. Disperse blue 79）
水处理剂 硫酸亚铁
Water treatment chemicals—Ferrous sulphate
表面化学分析 深度剖析 用机械轮廓仪栅网复型法测量溅射速率
Surface chemical analysis—Depth profiling—Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
表面化学分析 俄歇电子能谱 荷电控制与校正方法报告的规范要求
Surface chemical analysis—Auger electron spectroscopy—Reporting of methods used for charge control and charge correction
表面化学分析 辉光放电发射光谱定量成分深度剖析的通用规程
Surface chemical analysis—General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
表面化学分析 辉光放电发射光谱法分析金属氧化物膜
Surface chemical analysis—Analysis of metal oxide films by glow-discharge optical emission spectrometry