GB/T 41064-2021
ActiveSurface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
表面化学分析 深度剖析 用单层和多层薄膜测定X射线光电子能谱、俄歇电子能谱和二次离子质谱中深度剖析溅射速率的方法
🔗 Related Standards / 同类标准
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Surface chemical analysis—Auger electron spectroscopy—Derivation of chemical information
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Nanotechnologies—Determination of specific surface area of graphene materials—Methylene blue adsorption method
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