GB/T 41064-2021

Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films

表面化学分析 深度剖析 用单层和多层薄膜测定X射线光电子能谱、俄歇电子能谱和二次离子质谱中深度剖析溅射速率的方法