GB/T 34649-2017

Active

Magnetron sputtering ruthenium target

磁控溅射用钌靶

Standard Type
GBT
ICS
77.150.99
CCS
H68
Status
现行
Issue Date
2017-09-29
Implementation
2018-04-01
Responsible Dept
中国有色金属工业协会
Drafting Unit
N/A