GB/T 28275-2012

Active

Silicon-based MEMS fabrication technology - Specification for KOH etch process

硅基MEMS制造技术 氢氧化钾腐蚀工艺规范

Standard Type
GBT
ICS
31.200
CCS
L55
Status
现行
Issue Date
2012-05-11
Implementation
2012-12-01
Responsible Dept
国家标准委
Drafting Unit
N/A