Home / Standards / GB/T 26070-2010 GB/T 26070-2010 Active Characterization of subsurface damage in polished compound semiconductor wafers by reflectance difference spectroscopy method 化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法 Standard Type GBT ICS 77.040.99 CCS H17 Status 现行 Issue Date 2011-01-10 Implementation 2011-10-01 Responsible Dept 国家标准委 Drafting Unit 国家标准委