Home / Standards / GB/T 25188-2010 GB/T 25188-2010 Active Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy 硅晶片表面超薄氧化硅层厚度的测量 X射线光电子能谱法 Standard Type GBT ICS 71.040.40 CCS G04 Status 现行 Issue Date 2010-09-26 Implementation 2011-08-01 Responsible Dept 中国科学院 Drafting Unit N/A