Home / Standards / GB/T 24580-2009 GB/T 24580-2009 Active Test method for measuring boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry 重掺n型硅衬底中硼沾污的二次离子质谱检测方法 Standard Type GBT ICS 29.045 CCS H80 Status 现行 Issue Date 2009-10-30 Implementation 2010-06-01 Responsible Dept 国家标准委 Drafting Unit N/A