GB/T 24578-2024

Active

Test method for measuring surface metal contamination on semiconductor wafers —Total reflection X-Ray fluorescence spectroscopy

半导体晶片表面金属沾污的测定 全反射X射线荧光光谱法

Standard Type
GBT
ICS
77.040
CCS
H21
Status
现行
Issue Date
2024-07-24
Implementation
2025-02-01
Responsible Dept
国家标准委
Drafting Unit
N/A