GB/T 20176-2025

Active

Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials

表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度

Standard Type
GBT
ICS
71.040.40
CCS
G 04
Status
现行
Issue Date
2025-06-30
Implementation
2026-01-01
Responsible Dept
中国科学院
Drafting Unit
N/A